Articles on Photoemission Electron Microscopy
Year: 2006, 2004, 2003, 2002, 2001, 1999, 1998, 1997, 1994


  • A. Gloskovskii, S. A. Nepijko, M. Cinchetti, G. Schönhense, G. H. Fecher, H. C. Kandpal, C. Felser, H. A. Therese, N. Zink, and W. Tremel; Time-of-flight photoelectron spectromicroscopy of single MoS2 nanotubes; J. Appl. Phys. 100 (2006) 084330
  • 2004

  • M.D. v. Przychowski, G.K.L.Marx, G.H.Fecher, and G. Schönhense; A Spatially Resolved Investigation of Oxygen Adsorption on Polycrystalline Copper and Titanium by Means of Photoemission Electron Microscopy; Surf. Sci. 549 (2004) 37
  • A.Oelsner, A.Krasyuk, G.H.Fecher, C.M.Schneider, and G.Schönhense; Image Enhancement in Photoemission Electron Microscopy by means of Imaging Time-of-Flight Analysis; J. Electron Spectrosc. Relat.  Phenom 137-140 (2004) 757
  • 2003

  • M.Chinchetti, A.Oelsner, G.H.Fecher, H.J.Elmers, and G.Schönhense; Observation of Cu surface inhomogeneities by Multiphoton Photoemission Spectro-Microscopy; Appl.Phys.Lett. 83 (2003) 1503
  • M.Chinchetti, A.V.Gloskowskii, D.A.Valdaitsev, A.Oelsner, G.H.Fecher, S.A.Nepijko, H.-J.Elmers, and G.Schönhense;Emission Electron Microscopy of Nanoparticles in Strong fs Laser Fields; Microsc. Microanal. 9 (Suppl. 3) (2003) 168
  • 2002

  • S.A.Nepijko, N.N.Sedov, O.Schmidt, G.H.Fecher, E.I.Smirnov, and G.Schönhese; Imaging of three-dimensional islands by means of photoemission electron microscopy; Annal.Phys. 11 (2002) 39
  • A.Oelsner, Ch.Ziethen, G.H.Fecher, and G.Schönhense; Imaging of Dichroism in Photoemission Electron Microscopy at Non-magnetic Materials Using Circularly Polarized Light;Surf.Rev.Lett.9 (2002) 509
  • G.H.Fecher, O.Schmidt, Y.Hwu, and G.Schönhense; Multiphoton Photoemission Electron Microscopy Using Femtosecond Laser Radiation; J.Elec.Spec.Rel.Phen. 128 (2002) 77
  • 2001

  • G.Schönhense, A.Oelsner, O.Schmidt, G.H.Fecher, V.Merkel, O.Jagutzki, and H.Schmidt-Böcking; Time-of-Flight Photoemission Electron Microscopy - A New way to Chemical Surface Analysis; Surf.Sci.  480 (2001) 180
  • Y.Hwu, W.L.Tsai, B.Lai, J.H.Je, G.H.Fecher,  M.Bertolo, and G.Margaritondo; Using Photoelectron Emission Microscopes with Hard X-rays; Surf.Sci. 480 (2001) 188
  • O.Schmidt and G.H.Fecher; The Lateral Variation of Solid State Reactions at Surfaces Studied by Means of Photoemission Electron Microscopy: Formation of Titanium Silicides; Surf.Sci. 482-485 (2001) 335
  • O. Schmidt, T.A.Fazan, J.Morais, and G.H.Fecher; Microanalysis of the Surfaces of Natural Iron-Based Minerals by Means of Synchrotron Radiation Based Experimental Techniques; Surf.Sci.  482-485 (2001) 568
  • O.Schmidt, G.H.Fecher, Y.Hwu, and  G.Schönhense; The Spatial Distribution of Non-Linear Effects in Multi-Photon Photoemission of Adsorbates on Si(111); Surf.Sci. 482-485 (2001) 687
  • C.M.Schneider, O. de Haas, U.Muschiol, N.Cramer, A.Oelsner, M.Klais, O.Schmidt, G.H.Fecher, W.Jark, and G.Schönhense;Photoemission Microscopy from Magnetically Coupled Thin Film Systems; J.Magn.Magn.Mat. 233 (2001) 14
  • 1999

  • G.H.Fecher and Y.Hwu; Photoabsorption and MXCD in Photoemission Microscopy for Characterisation of Advanced Materials; Jpn.J.Appl.Phys. 38 (1999) S 313
  • G.H.Fecher, Y.Hwu, Y.-D.Yao, Y.-Y.Lee, G.M.Chow, W.Swiech; Photoabsorption and MXCD in Photoemission Microscopy for Characterization of Advanced Materials; J.Elec.Spec.Rel.Phen.101-103 (1999) 937
  • W.Grahneis, Ch.Ziethen, G.H.Fecher,  and G.Schönhense; Combined Chemical Microanalysis using SAM and X-PEEM; Jpn.J.Appl.Phys. 38 (1999) S 317
  • Y.Hwu, W.-L. Tsai, D.Y.Noh, J.H.Je,  G.H.Fecher, M.Bertolo, H.Berger, and G.Margaritondo; The Development  and Application of Imaging EXAFS Spectromicroscopy; Jpn.J.Appl.Phys. 38 (1999) S 646
  • U.Kleineberg, D.Menke, F.Hamelmann,  U.Heinzmann, O.Schmidt, G.H.Fecher, G.Schönhense; Photoemission  Microscopy with Microspot-XPS by Use of Undulator Radiation and a High-Throughput Multilayer Monochromotar at BESSY; J.Elec.Spec.Rel.Phen. 101-103 (1999) 931
  • 1998

  • G.H.Fecher, M.Huth, Y.Hwu, W.Swiech;Photoemission micro-imaging and -spectroscopy of devices made from complex materials; Eds.: H.A.C. Benavides and M.J.Yacaman;Electron Microscopy 1998, Vol.II, Material Science 1, p.321; IOP, Bristol and Philadelphia (1998)
  • O.Schmidt, Ch.Ziethen, G.H.Fecher, M.Merkel, M.Escher, D.Menke, U.Kleineberg, U.Heinzmann, G.Schönhense;Chemical Microanalysis by Selected-area ESCA using an Electron Energy Filter in a Photoemission Microscope; J.Elec.Spec.Rel Phen.88-91 (1998) 1009
  • W.Swiech, R.Frömter, C.M.Schneider, W.Kuch, Ch.Ziethen, O.Schmidt, G.H.Fecher, G.Schönhense, J.Kirschner;Magnetically Resolved and element specific imaging with photoelectrons using an immersion lens column; Eds.: H.A.C. Benavides and M.J.Yacaman; Electron Microscopy 1998, Vol.II, Material Science 1, p.511; IOP, Bristol and Philadelphia (1998)
  • W.Swiech, G.H.Fecher, M.Huth, O.Schmidt  , N.-F.Cheng, C.-K. Lin, C.-Y.Tung, Y.Hwu; Photo-Absorption Spectromicroscopy as a Microchemical Probe to Characterize Devices Made of Complex Materials; Appl.Phys. A67 (1998)
  • Ch.Ziethen, O.Schmidt, G.H.Fecher, C.M.Schneider, G.Schönhense, R.Frömter, M.Seider, K.Grzelakowski M.Merkel, D.Funnemann, W.Swiech, H.Gundlach, J.Kirschner; Fast elemental Mapping and Magnetic Imaging with High Lateral Resolution Using a Novel Photoemission Microscope; J.Elec.Spec.Rel Phen. 88-91 (1998) 983
  • 1997

  • G.H.Fecher, Y.Hwu, W.Swiech; Chemical Microimaging and Microspectroscopy of Surfaces with a Photoemission Microscope; Surf Sci. 377-379 (1997) 1106
  • C.M.Schneider, R.Frömter, W.Swiech,Ch.Ziethen,O.Schmidt, G.H.Fecher, G.Schönhense, J.Kirschner; Magnetic Spectromicroscopy and Microspectroscopy with Submicrometer  Resolution, J.Appl.Phys. 81 (1997) 5020
  • W.Swiech, G.H.Fecher, Ch.Ziethen,  O.Schmidt, G.Schönhense, K.Grzelakowski, C.M.Schneider, R.Frömter,  H.P.Oepen, J.Kirschner; Recent Progress in Photoemission Microscopie  with Emphasis on Chemical and Magnetic Sensitivity; J.Elec.Spec.Rel.Phen. 84 (1997) 171
  • 1994

  • S.Corvers, G.H.Fecher, K.Bange, O.Anderson, W.Gutmannsbauer, H.Haefke; Thin oxide films: An AFM and TEM study; Glastech.Ber. Glass Sci.Technol 67 C (1994) 484
  • G.H.Fecher, J.Bansmann, Ch.Grünewald, A.Oelsner, Ch.Ostertag, G.Schönhense; Oxidation of rubidium at platinum (111); Surf.Sci. 307-309 (1994) 70
  • copyright: g.h. fecher @ 1999 - 2007;  last updated: 23. Sept. 2007